电子元件及其制作方法;ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREOF

摘要

一种电子元件的制作方法，包括：提供一基板；在基板上形成一源极与一汲极；在基板上形成一半导体层；在半导体层上形成一第一光敏材料层；利用一第一曝光显影制程将第一光敏材料层的一第一部分移除，而留下第一光敏材料层的一第二部分以作为一第一闸绝缘层；将半导体层图案化，以形成一位于第一闸绝缘层下的通道层；在基板上形成一第二光敏材料层；利用一第二曝光显影制程将第二光敏材料层的一第三部分移除，以暴露出至少部分第一闸绝缘层；以及在第一闸绝缘层上形成一第一闸极。一种电子元件亦被提出。; forming a source and a drain on the substrate; forming a semiconductor layer on the substrate; forming a first light sensitive material layer on the semiconductor layer; removing a first portion of the first light sensitive material layer by a first exposure and develop process and maintaining a second portion of the first light sensitive material layer to serve as a first gate insulation layer; patterning the semiconductor layer to form a channel layer below the first gate insulation layer; forming a second light sensitive material layer on the substrate; removing a third portion of the second light sensitive material layer by a second exposure and develop process to expose at least a part of the first gate insulation layer; and forming a first gate on the first gate insulation layer. An electronic device is also provided.