IMPRINT APPARATUS, IMPRINT METHOD, AND METHOD FOR PRODUCING DEVICE

摘要

An imprint apparatus for transferring a pattern to an imprint material using a mold includes a substrate holding mechanism and a control unit. The substrate holding mechanism is configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the areas and to hold the substrate. The control unit is configured to, when a plurality of shots is formed on the substrate, control an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another, makes the attracting force in the area of the substrate holding mechanism corresponding to the shot to which the pattern is transferred among the plurality of areas smaller than the attracting force at the time of the imprint operation and suck the substrate.

主权项

1. An imprint method for forming a pattern of an imprint material on a substrate using a mold, the method comprising:
holding the substrate by a holder having a plurality of areas where an attracting force for attracting the substrate can be independently varied; separating the mold from the imprint material in a first area of the plurality of the area such that the attracting force reduced to a level below the attracting force for holding the substrate; and lowering the attracting force for attracting the substrate in the first area of the holder than the attracting force when separating the mold from the imprint material, and then making the attracting force larger than the smaller attracting force.