发明名称 PLASMA TREATMENT SYSTEM
摘要 In this plasma treatment system, a coefficient (K) serving as the minimum amount of water required to generate plasma is provided, said coefficient being the ratio of the supply amount of physiological saline to the suction amount of the physiological saline. Furthermore, in the plasma treatment system, the required supply amount and suction amount of the physiological saline are set from the coefficient (K) obtained on the basis of the high-frequency-energy output level, and plasma treatment is executed.
申请公布号 WO2015156156(A1) 申请公布日期 2015.10.15
申请号 WO2015JP59754 申请日期 2015.03.27
申请人 OLYMPUS CORPORATION 发明人 ISHIKAWA, MANABU;KIMURA, SHUICHI;WATANABE, KOICHIRO
分类号 A61B18/12 主分类号 A61B18/12
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