发明名称 PACKAGE SUBSTRATE COMPRISING SURFACE INTERCONNECT AND CAVITY COMPRISING ELECTROLESS FILL
摘要 Some novel features pertain to a substrate that includes a first dielectric layer, a first interconnect, a first cavity, and a first electroless metal layer. The first dielectric layer includes a first surface and a second surface. The first interconnect is on the first surface of the substrate layer. The first cavity traverses the first surface of the first dielectric layer. The first electroless metal layer is formed at least partially in the first cavity. The first electroless metal layer defines a second interconnect embedded in the first dielectric layer. In some implementations, the substrate further includes a core layer. The core layer includes a first surface and a second surface. The first surface of the core layer is coupled to the second surface of the first dielectric layer. In some implementations, the substrate further includes a second dielectric layer.
申请公布号 US2015296616(A1) 申请公布日期 2015.10.15
申请号 US201414251486 申请日期 2014.04.11
申请人 QUALCOMM Incorporated 发明人 Jomaa Houssam Wafic;Bchir Omar James;Kim Chin-Kwan
分类号 H05K1/11;H05K3/42;H05K1/02 主分类号 H05K1/11
代理机构 代理人
主权项 1. A substrate comprising: a first dielectric layer comprising a first surface and a second surface; a first interconnect on the first surface of the substrate layer; a first cavity traversing the first surface of the first dielectric layer; and a first electroless metal layer formed at least partially in the first cavity, wherein the first electroless metal layer defines a second interconnect embedded in the first dielectric layer.
地址 San Diego CA US