半導体プロセスにおけるアルコキシシラン加水分解反応用の触媒及びそれを含む配合物

摘要

A stable formulation comprising a silicon containing precursor selected from an alkoxysilane, aryloxysilane, or alkylalkoxysilane and a catalyst compound comprising a haloalkoxyalkylsilane or haloaryloxyalkylsilane wherein the substitutents within the silicon-containing precursor and catalyst compound are the same are described herein. More specifically, the formulation comprises a silicon-containing precursor comprising an alkoxyalkylsilane or aryloxysilane having a formula of Si(OR 1 ) n R 2 4-n and a catalyst comprising haloalkoxyalkylsilane having a formula of XSi(OR 1 ) n R 2 3-n; or a silicon-containing precursor comprising an alkoxysilane or aryloxysilane having a formula of R 2 3-p (R 1 O) p Si-R 3 -Si(OR 1 ) p R 2 3-p and a catalyst comprising a haloalkoxyalkylsilane or haloaryloxyalkylsilane having a formula of (R 1 O) m R 2 2-m (X)Si-R 3 -Si(OR 4 ) 2 R 5 wherein at least one or all of the R 1 and R 2 substituents are the same in both the silicon-containing precursor and catalyst compound are described herein. The formulations can be used in semiconductor deposition process, such as for example, a flowable silicon oxide process.