| 摘要 |
The purpose of the present invention is to provide an adhesive for a pellicle, which can suppresses generation of outgas, which contaminates a pellicle film or a photomask and has heat resistance for enduring high temperatures, and a pellicle for EUV attached by using the same. The adhesive of the present invention is a low outgas type adhesive (13) for a pellicle which attaches a pellicle film (11) to a pellicle frame (12) and is a silicone-based adhesive. The amount of outgas of the adhesive satisfies a condition of TML being 1.0% or lower and CVCM being 0.1% or lower when tested in accordance with ASTM_E595-93. In addition, the pellicle of the present invention is a pellicle for EUV which is exposed to the temperature of 100 to 200°C when exposed to EUV light. The pellicle film (11) satisfies the condition and is attached to the pellicle frame (12) by using the adhesive capable of enduring the temperature of 100 to 200°C. |
