| 发明名称 | Reactor and method for production of silicon | ||
| 摘要 | Reactor for producing silicon by chemical vapor deposition, the reactor comprising a reactor body that forms a container, at least one inlet for a silicon-bearing gas, at least one outlet, and at least one heating device as a part of or operatively arranged to the reactor, distinctive in that at least one main part of the reactor, which part is exposed for silicon-bearing gas and which part is heated for deposition of silicon on said part, is produced from silicon. Method for operation of the reactor. | ||
| 申请公布号 | US9156704(B2) | 申请公布日期 | 2015.10.13 |
| 申请号 | US201013266850 | 申请日期 | 2010.05.27 |
| 申请人 | Dynatec Engineering AS | 发明人 | Filtvedt Josef;Filtvedt Werner O. |
| 分类号 | C01B33/027;C01B33/029;C01B33/03;C01B33/031;C01B33/033;C01B33/035 | 主分类号 | C01B33/027 |
| 代理机构 | Winstead PC | 代理人 | Winstead PC |
| 主权项 | 1. A reactor for producing silicon by chemical vapor deposition, the reactor comprising: a reactor body that forms a container; at least one inlet for a silicon-bearing gas; at least one outlet; a wall made of silicon of at least metallurgical quality; and at least one heating device as a part of or operatively arranged to the reactor arranged to heat the wall for chemical vapor deposition of solid silicon on an inside of said wall. | ||
| 地址 | Askim NO | ||