| 摘要 |
<p>The invention relates to a device for converting a gas flow containing at least one polluting chemical species (CF4) to be treated, characterized in that it includes a first plasma chamber (21) provided with a plasma source (24) and at least one second plasma chamber (22) provided with a plasma source (26), said chambers having the gas flow passing consecutively therethrough; the first plasma source (24) is configured such as to generate a first plasma capable of at least partially breaking up, via ionization, the at least one polluting chemical species (CF4) to be treated; and the at least one second plasma chamber (22) includes means (28) for injecting a reagent (H2O) contributing, in a second plasma generated by the second source (26), to the conversion of the at least one polluting chemical species at least partially broken up by the first plasma. Advantageously, the injection means (28) are configured such as to make it possible to inject the reagent (H2O) directly into the second plasma.</p> |
