发明名称 Scanning exposure apparatus using microlens array
摘要 A microlens array is a stacked body of four unit microlens arrays, and the optical axis of a portion of the unit microlens arrays can be shifted from the optical axis of the other unit microlens arrays. In a scanning exposure apparatus, a CCD line camera detects an image on a substrate, and using a first-layer pattern on the substrate as a reference pattern, in a case in which a mask exposure pattern does not match the reference pattern, shifts the optical axis of the microlenses to adjust the magnification of a projection pattern using the microlens array. This makes it possible to adjust the exposure position using the microlens array so that even when the exposure pattern deviates from the reference pattern, the deviation can be detected during exposure and an exposure pattern misregistration can be prevented, enabling the precision of the exposure pattern to be enhanced in an overlay exposure.
申请公布号 US9152057(B2) 申请公布日期 2015.10.06
申请号 US201113880352 申请日期 2011.09.12
申请人 V TECHNOLOGY CO., LTD. 发明人 Mizumura Michinobu;Hatanaka Makoto
分类号 G03F7/20 主分类号 G03F7/20
代理机构 McGinn IP Law Group, PLLC 代理人 McGinn IP Law Group, PLLC
主权项 1. A scanning exposure apparatus using a microlens array, comprising: a microlens array being arranged above a substrate to be subjected to exposure and having a plurality of unit microlens arrays arranged by being stacked on top of one another, the unit microlens arrays configured having each of a plurality of microlenses arranged two-dimensionally therein; a mask arranged above the microlens arrays and having a prescribed exposure pattern formed thereon; an exposure light source for irradiating an exposure light on the mask; and a movement member for moving at least a portion of the unit microlens arrays so that the optical axis of the component microlenses thereof is shifted relative to the other unit microlens arrays, wherein the exposure position on the substrate is adjusted using the microlens array by shifting the optical axis between the unit microlens arrays, and wherein the microlens array is configured from four unit microlens arrays, and is configured to shift the microlens optical axis between the unit microlens arrays of a first layer and a second layer, and the unit microlens arrays of a third layer and a fourth layer.
地址 Yokohama-shi, Kanagawa JP