Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method

摘要

According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3).;;In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.

主权项

1. A fluorine-containing sulfonate resin comprising a repeating unit of the following general formula (3):where A each independently represent a hydrogen atom, a fluorine atom or a trifluoromethyl group; n represents an integer of 1 to 10; W represents a divalent linking group, selected from the group consisting of substituted or unsubstituted methylene groups and substituted or unsubstituted divalent alicyclic hydrocarbon groups or a divalent linking group formed by combination of one kind or two or more kinds selected from the group consisting of substituted or unsubstituted methylene groups and substituted or unsubstituted divalent alicyclic hydrocarbon groups; any number of hydrogen atoms bonded to carbon atoms of the divalent linking group may be substituted with a fluorine atom; any carbon atoms may form a ring with or without a substituent in the divalent linking group; R1 represents an acid labile group; and M+ represents a monovalent cation.