Photomasks and methods for using same

摘要

Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.

主权项

1. A photomask suitable for forming a photoresist pattern on an aluminum substrate, the photoresist pattern associated with a surface feature created while anodizing the aluminum substrate, the photomask comprising:
an exterior corner including a first pre-distortion feature, the first pre-distortion feature configured to reduce an amount of corner erosion caused by a subsequent blasting operation at a corresponding exterior corner of the photoresist pattern, wherein the first pre-distortion feature is used to create a first feature at the exterior corner of the photoresist pattern that compensates for erosion of the exterior corner of the photoresist pattern from a blasting media; and an interior corner including a second pre-distortion feature, the second pre-distortion feature configured to reduce an amount of corner erosion caused by a subsequent blasting operation at a corresponding interior corner of the photoresist pattern, wherein the second pre-distortion feature is used to create a second feature at the interior corner of the photoresist pattern that compensates for erosion of the interior corner of the photoresist pattern from the blasting media.