发明名称 |
Thin film transistor array panel and method of manufacturing the same |
摘要 |
A thin film transistor array panel includes a substrate; a gate line located over the substrate and including a gate pad portion; a data line located over the gate line and including a source electrode and a data pad portion; a drain electrode; a first passivation layer located over the data line and the drain electrode; an organic insulating layer located over the first passivation layer and having a contact hole; a first field generating electrode located over the organic insulating layer and having an opening; a second passivation layer located over the first field generating electrode; and a second field generating electrode located over the second passivation layer. The contact hole coincides with or is smaller than the opening, and the contact hole has a tapered structure. |
申请公布号 |
US9153603(B2) |
申请公布日期 |
2015.10.06 |
申请号 |
US201314105048 |
申请日期 |
2013.12.12 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Park Ji-Young;Kim Dong Il;Kim Sang Gab |
分类号 |
H01L21/00;H01L27/12 |
主分类号 |
H01L21/00 |
代理机构 |
Knobbe Martens Olson & Bear, LLP |
代理人 |
Knobbe Martens Olson & Bear, LLP |
主权项 |
1. A method of manufacturing a thin film transistor array panel, comprising:
forming a gate line and a data line over an insulation substrate; forming an organic layer over the gate line and the data line; stacking a conductive layer over the organic layer; forming a first photosensitive film pattern over the conductive layer; forming a first field generating electrode by etching the conductive layer using the first photosensitive film pattern as a mask; deforming at least a portion of the first photosensitive film pattern to contact the organic layer; and forming an organic insulating layer including at least a contact hole by etching the organic layer using the first photosensitive film pattern as a mask. |
地址 |
Yongin KR |