发明名称 Thin film transistor array panel and method of manufacturing the same
摘要 A thin film transistor array panel includes a substrate; a gate line located over the substrate and including a gate pad portion; a data line located over the gate line and including a source electrode and a data pad portion; a drain electrode; a first passivation layer located over the data line and the drain electrode; an organic insulating layer located over the first passivation layer and having a contact hole; a first field generating electrode located over the organic insulating layer and having an opening; a second passivation layer located over the first field generating electrode; and a second field generating electrode located over the second passivation layer. The contact hole coincides with or is smaller than the opening, and the contact hole has a tapered structure.
申请公布号 US9153603(B2) 申请公布日期 2015.10.06
申请号 US201314105048 申请日期 2013.12.12
申请人 Samsung Display Co., Ltd. 发明人 Park Ji-Young;Kim Dong Il;Kim Sang Gab
分类号 H01L21/00;H01L27/12 主分类号 H01L21/00
代理机构 Knobbe Martens Olson & Bear, LLP 代理人 Knobbe Martens Olson & Bear, LLP
主权项 1. A method of manufacturing a thin film transistor array panel, comprising: forming a gate line and a data line over an insulation substrate; forming an organic layer over the gate line and the data line; stacking a conductive layer over the organic layer; forming a first photosensitive film pattern over the conductive layer; forming a first field generating electrode by etching the conductive layer using the first photosensitive film pattern as a mask; deforming at least a portion of the first photosensitive film pattern to contact the organic layer; and forming an organic insulating layer including at least a contact hole by etching the organic layer using the first photosensitive film pattern as a mask.
地址 Yongin KR