| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is advantageous for achieving both throughput and overlay accuracy.SOLUTION: A lithographic apparatus includes: a plurality of charged particle optical systems, each of which irradiates a substrate with charged particle beams; and a plurality of alignment sensors including the alignment sensors arranged among the plurality of charged particle optical systems. In parallel with pattern formation, a processing part generates information on at least one out of a position and a shape of a region on the substrate based on output of the plurality of alignment sensors. |
