发明名称 ION BEAM PURITY MONITORING DEVICE, METHOD AND PROGRAM
摘要 PROBLEM TO BE SOLVED: To provide an ion beam purity monitoring technique which makes possible to properly execute the purity monitoring in real time while continuing an output operation.SOLUTION: An ion beam purity monitoring device 30 comprises: an acquisition part 31 operable to take detection data 26 concerning ions emitted in a direction having an angle to a main axis X of an ion beam emitted from a target 12 irradiated with laser; a time counter 32 operable to repeat the counting of time according to the same cycle as that of laser oscillation; an allocation part 33 operable to allocate a signal value of the detection data 26 to a time of counting time; a setting part 35 operable to set a timing corresponding to each charge-to-mass ratio of impurity ions different from an intended ion forming the ion beam; a determination part 36 operable to make determination on whether or not the signal value of the detection data 26 in line with each timing of the impurity ions is above a threshold; and an output part 37 operable to output an abnormality signal on condition that the signal value is determined to be above the threshold.
申请公布号 JP2015176814(A) 申请公布日期 2015.10.05
申请号 JP20140053832 申请日期 2014.03.17
申请人 TOSHIBA CORP 发明人 SUMIYA AKIKO;SAKO TAKAYUKI;SATO KIYOKAZU;KANAI YOSHIHARU
分类号 H01J27/24;H05H7/08;H05H13/04 主分类号 H01J27/24
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