发明名称 |
MODIFIED MICROGRINDING PROCESS |
摘要 |
<p>A method of forming a substrate is performed by grinding a substrate using abrasives so that both major surfaces of the substrate achieve desired flatness, smoothness , or both. In an embodiment ,a coarser abrasive is used to grind one major surface , while a finer abrasive is simultaneously used to grind the other major surface. A single grinding step can used to produce a substrate having opposing surfaces of different surface roughnesses. This may help to eliminate a typical second downstream fine polishing step used in the prior art. Embodiments can be used with a wide variety of substrates, including sapphire, silicon carbide and gallium nitride single crystal structures grown by various techniques.</p> |
申请公布号 |
IN3023DEN2015(A) |
申请公布日期 |
2015.10.02 |
申请号 |
IN2015DE03023 |
申请日期 |
2015.04.10 |
申请人 |
SAINT GOBAIN CERAMICS & PLASTICS, INC. |
发明人 |
RIZZUTO, ROBERT A.,;KRISHNAN,AJAY;ARCONA, CHRISTOPHER,;TANIKELLA, ANAND, |
分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|