发明名称 |
PROCESS FOR GROWING AT LEAST ONE NANOWIRE USING A TRANSITION METAL NITRIDE LAYER OBTAINED IN TWO STEPS |
摘要 |
The process for growing at least one semiconductor nanowire (3), said growth process comprising a step of forming, on a substrate (1), a nucleation layer (2) for the growth of the nanowire (3) and a step of growth of the nanowire (3). The step of formation of the nucleation layer (2) comprises the following steps: deposition onto the substrate (1) of a layer of a transition metal (4) chosen from Ti, V, Cr, Zr, Nb, Mo, Hf, Ta; nitridation of at least a part (2) of the transition metal layer so as to form a transition metal nitride layer having a surface intended for growing the nanowire (3). |
申请公布号 |
US2015279672(A1) |
申请公布日期 |
2015.10.01 |
申请号 |
US201314438480 |
申请日期 |
2013.10.25 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES ;ALEDIA |
发明人 |
Hyot Bérangère;Amstatt Benoit;Armand Marie-Françoise;Dupont Florian |
分类号 |
H01L21/02;H01L21/66;H01L33/00 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
1. A process for growing at least one semiconductor nanowire, said growing process comprising:
forming, on a substrate, a nucleation layer for the growth of the nanowire, and growing the nanowire, wherein the step of forming the nucleation layer comprises:
depositing onto the substrate a layer of a transition metal chosen from Ti, V, Cr, Zr, Nb, Mo, Hf, and Ta, andperforming nitridation of at least part of the transition metal layer so as to form a transition metal nitride layer having a surface intended for the growth of the nanowire. |
地址 |
Paris FR |