发明名称 PROCESS FOR GROWING AT LEAST ONE NANOWIRE USING A TRANSITION METAL NITRIDE LAYER OBTAINED IN TWO STEPS
摘要 The process for growing at least one semiconductor nanowire (3), said growth process comprising a step of forming, on a substrate (1), a nucleation layer (2) for the growth of the nanowire (3) and a step of growth of the nanowire (3). The step of formation of the nucleation layer (2) comprises the following steps: deposition onto the substrate (1) of a layer of a transition metal (4) chosen from Ti, V, Cr, Zr, Nb, Mo, Hf, Ta; nitridation of at least a part (2) of the transition metal layer so as to form a transition metal nitride layer having a surface intended for growing the nanowire (3).
申请公布号 US2015279672(A1) 申请公布日期 2015.10.01
申请号 US201314438480 申请日期 2013.10.25
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES ;ALEDIA 发明人 Hyot Bérangère;Amstatt Benoit;Armand Marie-Françoise;Dupont Florian
分类号 H01L21/02;H01L21/66;H01L33/00 主分类号 H01L21/02
代理机构 代理人
主权项 1. A process for growing at least one semiconductor nanowire, said growing process comprising: forming, on a substrate, a nucleation layer for the growth of the nanowire, and growing the nanowire, wherein the step of forming the nucleation layer comprises: depositing onto the substrate a layer of a transition metal chosen from Ti, V, Cr, Zr, Nb, Mo, Hf, and Ta, andperforming nitridation of at least part of the transition metal layer so as to form a transition metal nitride layer having a surface intended for the growth of the nanowire.
地址 Paris FR