SUBSTRATE-PROCESSING DEVICE, SEMICONDUCTOR-DEVICE MANUFACTURING METHOD, AND FURNACE-THROAT COVER

摘要

[Problem] To provide a technology that can inhibit the adhesion of byproducts and the generation of particles. [Solution] This invention is provided with a reaction tube in which a substrate is processed, a furnace throat installed at the bottom end of said reaction tube, a cover, and one or more gas-supply units. A recess and a projection in which at least one notch that connects the recess to the inside surface of the furnace throat is formed are formed along the circumference of the inside-surface side of the top surface of the furnace throat. The cover is installed at a prescribed distance from the inside surface of the furnace throat and covers at least said inside surface. The one or more gas-supply units supply a gas to the recess in the furnace throat.