发明名称 CHARGED PARTICLE BEAM EMISSION SYSTEM AND TREATMENT PLANNING DEVICE
摘要 A charged particle beam emission system and a method for controlling the same, wherein an accelerator is operated through combining single emission operation and multistage emission operation, thereby making it possible to improve the dose rate. Among layers set on the basis of the shape of an affected area by a treatment planning device (140), a layer that is deemed to require a higher target irradiation dose than the irradiation dose that can be applied in a single cycle of single emission operation of a synchrotron (12) is irradiated with a beam in a single emission operation. At the point in time at which, at the end of the operation cycle of the synchrotron (12), the remainder of the target emission dose for the layer falls below the irradiation dose that can be applied in a single cycle of a single emission operation, a transition is made to irradiating the next layer. The above procedure is repeated to the final layer. The method for operating the synchrotron (12) is switched from single emission operation to multistage emission operation, the irradiation operation returns to irradiating the first layer, and layers for which irradiation is not complete are sequentially irradiated.
申请公布号 WO2015145705(A1) 申请公布日期 2015.10.01
申请号 WO2014JP59065 申请日期 2014.03.28
申请人 HITACHI, LTD.;HITACHI INFORMATION & CONTROL SOLUTIONS, LTD. 发明人 OKURA SATORU;MORIYAMA KUNIO;MATSUSHITA TAKAYOSHI;HORI YOSHIHITO
分类号 H05H13/04;A61N5/10;G21K5/04 主分类号 H05H13/04
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