RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND RESIST PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which provides good pattern shapes, is excellent in MEEF performance and suppresses occurrence of defects, e.g. bridges, and to provide a polymer suitably usable in the radiation-sensitive resin composition and a pattern formation method using the radiation-sensitive resin composition.SOLUTION: A radiation-sensitive resin composition comprises: [A] a polymer which has structural units (I) having a specified acid-dissociative group and acrylate structural units (II-2) and (II-3) containing a fluorine atom in a side chain, with a content of fluorine atoms of 5 mass% or higher; [B] polymer having an acid-dissociative group having a content of fluorine atoms of lower than 5 mass%; and [C] a radiation-sensitive acid generator.