发明名称 Composite Substrate, Production Method Thereof, and Acoustic Wave Device
摘要 A composite substrate production method of the invention includes (a) a step of mirror polishing a substrate stack having a diameter of 4 inch or more, the substrate stack including a piezoelectric substrate and a support substrate bonded to each other, the mirror polishing being performed on the piezoelectric substrate side until the thickness of the piezoelectric substrate reaches 3 μm or less; (b) a step of creating data of the distribution of the thickness of the mirror-polished piezoelectric substrate; and (c) a step of performing machining with an ion beam machine based on the data of the thickness distribution so as to produce a composite substrate have some special technical features.
申请公布号 US2015280107(A1) 申请公布日期 2015.10.01
申请号 US201514737655 申请日期 2015.06.12
申请人 NGK INSULATORS, LTD. 发明人 Hori Yuji;Tai Tomoyoshi;Ikejiri Mitsuo
分类号 H01L41/332;H01L41/337;H01L41/107 主分类号 H01L41/332
代理机构 代理人
主权项 1. A composite substrate production method comprising: (a) a step of mirror polishing a substrate stack having a diameter of 4 inch or more, the substrate stack including a piezoelectric substrate and a support substrate bonded to each other, the mirror polishing being performed on the piezoelectric substrate side until the thickness of the piezoelectric substrate reaches 3 μm or less; (b) a step of creating data of the distribution of the thickness of the mirror-polished piezoelectric substrate; and (c) a step of performing machining with an ion beam machine based on the data of the thickness distribution so as to produce a composite substrate wherein the piezoelectric substrate has a thickness of 3 μm or less, the difference between the largest thickness and the smallest thickness of the piezoelectric substrate is 60 nm or less over the entire plane surface, and the piezoelectric substrate has such crystallinity that the full width at half maximum of an X-ray diffraction rocking curve is 100 arcsec or less.
地址 Aichi JP