| 发明名称 |
METHOD TO IMPROVE SURFACE ROUGHNESS AND ELIMINATE SHARP CORNERS ON AN ACTUATOR LAYER OF A MEMS DEVICE |
| 摘要 |
A method for forming an actuator layer of a MEMS device is disclosed. The method comprising etching the actuator layer and annealing the actuator layer after etching to reduce surface roughness of the MEMS device. |
| 申请公布号 |
US2015274517(A1) |
申请公布日期 |
2015.10.01 |
| 申请号 |
US201414453431 |
申请日期 |
2014.08.06 |
| 申请人 |
InvenSense, Inc. |
发明人 |
SMEYS Peter;SHIN Jongwoo;SHIN Jong Il |
| 分类号 |
B81C1/00 |
主分类号 |
B81C1/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for forming an actuator layer of a MEMS device comprising:
etching the actuator layer; and annealing the actuator layer after etching to reduce surface roughness of the MEMS device. |
| 地址 |
San Jose CA US |
