| 发明名称 |
ATOMIC LAYER DEPOSITION OF TANTALUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND NOVEL TANTALUM COMPLEXES |
| 摘要 |
Atomic layer deposition processes for the formation of tantalum-containing films on surfaces are provided. Also provided are novel tantalum complexes that can be used as tantalum precursors in the disclosed deposition processes.
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| 申请公布号 |
KR20080036140(A) |
申请公布日期 |
2008.04.24 |
| 申请号 |
KR20087005707 |
申请日期 |
2008.03.07 |
| 申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
THOMPSON JEFFERY SCOTT;RADZEWICH CATHERINE E. |
| 分类号 |
C23C16/455 |
主分类号 |
C23C16/455 |
| 代理机构 |
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