Pattern Forming Material, Pattern Forming Apparatus and Pattern Forming Process

摘要

The present invention aims to provide a pattern forming material that is capable of suppressing generation of wrinkles and static electric charge on a substrate in a lamination step in which the pattern forming material is laminated on the substrate as well as capable of forming a fine and precise pattern; a pattern forming apparatus provided with the pattern forming material; and a pattern forming process using the pattern forming material. To this end, the present invention provides a pattern forming material having a support, a photosensitive layer, and a protective film, the photosensitive layer and the protective film being formed in this order on the support, wherein the number of fish-eyes each having an area of 2,000 mum² or more and a maximum height measured from the film surface of 1 mum to 7 mum residing in the protective film is 50/m² to 1,000/m².