发明名称 Optical module for use in optical imaging device i.e. microlithography device, has holding device formed and/or optical unit is contacted, such that overflow rate of overflow amounts to specific value based on minimum overflow
摘要 <p>The module has an optical unit e.g. lens (107), and a holding device for holding the optical unit, where the optical unit defines a radial direction and a circumference direction in an extension plane. The holding device contacts the optical unit in an area of an overflow. The holding device is formed and/or optical unit is contacted, such that an overflow rate of the overflow amounts to 1.5 based on a minimum overflow, which is necessary for manufacturing the optical unit. The optical unit has the overflow in an area of its outer circumference. Independent claims are also included for the following: (1) an optical imaging device, in particular for the microlithography (2) a method for holding an optical unit.</p>
申请公布号 DE102007044054(A1) 申请公布日期 2008.04.17
申请号 DE20071044054 申请日期 2007.09.14
申请人 CARL ZEISS SMT AG 发明人 HEINTEL, WILLI;GEUPPERT, BERNHARD;BINGEL, ULRICH;HARTJES, JOACHIM;FEDERAU, HAGEN;KIRCHNER, HARALD;SCHWERTNER, TILMAN
分类号 G02B7/02 主分类号 G02B7/02
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