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发明名称
Verfahren zur Herstellung integrierter Schaltungen mit gleichförmigen Silizidsperrschichten
摘要
申请公布号
DE10321457(B4)
申请公布日期
2008.04.17
申请号
DE20031021457
申请日期
2003.05.13
申请人
SAMSUNG ELECTRONICS CO. LTD.
发明人
JANG, SE-MYEONG;JIN, GYO-YOUNG;OH, YONG-CHUL;KIM, HYUN-CHANG
分类号
H01L21/336;H01L21/8238;H01L21/28;H01L21/285;H01L21/8234;H01L21/8242;H01L27/10;H01L27/105;H01L27/108;H01L29/417;H01L29/78
主分类号
H01L21/336
代理机构
代理人
主权项
地址
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