| 摘要 |
A reticle pattern defect correcting apparatus comprises a lithographic emulation system including an optical emulation system and a micromachining defect correcting system including a reticle defect correcting mechanism with a cantilever. Since correction of a reticle pattern defect is carried out while the transferred image is being observed in real time by the optical emulation system, it is possible to achieve an efficient reticle pattern correction while avoiding overcorrection and other problems.
|
