| 摘要 |
PROBLEM TO BE SOLVED: To easily detect a line unevenness extended over a plurality of rectangular areas on a substrate where the plurality of rectangular areas having a uniform pattern is set by arraying vertically and laterally with a space. SOLUTION: An objective image is prepared in an objective image generating part 61 of this unevenness inspection device, by masking an area corresponding to the space between the rectangular areas on the substrate in a multigradation original image acquired by imaging the substrate, and a plurality of line unevenness element areas in which a ratio of a longitudinal length to a width along a direction perpendicular to a longitudinal direction gets a prescribed value or more is specified by a plurality of line unevenness element line segments, in a line unevenness element specifying part 63, respectively. The line unevenness extended over the plurality of rectangular areas is easily detected by detecting the two line unevenness element line segments having the same longitudinal direction direction (line segment extending direction), out of the plurality of line unevenness element line segments, arrayed longitudinal-directionally, and existing within the adjacent rectangular areas, in a line unevenness detecting part 64. COPYRIGHT: (C)2008,JPO&INPIT
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