发明名称 PROCESS PLASMA GENERATOR, AND MATERIAL PROCESSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a process plasma generator allowing plasma generation of a large-area (large-scale) or three-dimensionally arbitrary shape, capable of simply generating plasma in a vessel/place having an arbitrary shape, and of easily implementing its material processing application. <P>SOLUTION: A flexible sheet substrate 10 having a thickness of 10 &mu;m to 1 mm is formed by jointing a metal thin film for an electrode or a coil, for instance, a copper layer 12 to a flexible film, for instance, a polyimide layer 11. By using air for a plasma gas, and by supplying microwave power of 2.45 Ghz to an electrode gap 14 in a condition of 80 Torr, thermal nonequilibrium plasma is generated. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007242596(A) 申请公布日期 2007.09.20
申请号 JP20070019056 申请日期 2007.01.30
申请人 UNIV OF TOKYO;THINK LABORATORY CO LTD 发明人 OGATA TAKESHI;KIN SAIKO;TERAJIMA KAZUO;SHIGETA KAKU;SATO TSUTOMU;SHIGETA TATSUO
分类号 H05H1/46;B01J19/00;C23C16/50;H01L21/3065 主分类号 H05H1/46
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