| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which includes a processing unit for processing substrates and a substrate conveying means, and can suppress time and effort of a work for adjusting the inclination of the processing unit to be performed for delivering a substrate between the unit and the substrate conveying means. SOLUTION: The substrate processing apparatus includes inclination detectors provided on the processing unit stacked in a plurality of stages, and used to detect each of inclinations around an X-axis and a Y-axis as two axes on a horizontal plane with respect to a substrate placing surface in the processing unit; and a control unit for capturing a result of inclination of each of inclination detectors, displaying the inclinations around the X-axis and the Y-axis of the substrate placing surface on the basis of the result of detection, determining whether the inclination of each of the substrate placing surfaces comes within a permissible value, and displaying a result of determination. By adjusting only a required processing unit in accordance with display, time and effort can be reduced. COPYRIGHT: (C)2007,JPO&INPIT |
