发明名称 Thin film power MOS transistor, apparatus, and method
摘要 A thin film power transistor includes a plurality of first doped regions over a substrate and a second doped region forming a body. At least a portion of the body is disposed between the plurality of first doped regions. The thin film power transistor also includes a gate over the substrate. The thin film power transistor further includes a dielectric layer, at least a portion of which is disposed between (i) the gate and (ii) the first and second doped regions. In addition, the thin film power transistor includes a plurality of contacts contacting the plurality of first doped regions, where the plurality of first doped regions forms a source and a drain of the thin film power transistor. The first doped regions could represent n-type regions (such as N- regions), and the second doped region could represent a p-type region (such as a P- region). The first doped regions could also represent p-type regions, and the second doped region could represent an n-type region.
申请公布号 US2007200172(A1) 申请公布日期 2007.08.30
申请号 US20060355937 申请日期 2006.02.16
申请人 STMICROELECTRONICS, INC. 发明人 FANG MING;WANG FUCHAO
分类号 H01L27/12 主分类号 H01L27/12
代理机构 代理人
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