发明名称 N-TYPE SEMICONDUCTOR MATERIALS FOR THIN FILM TRANSISTORS
摘要 <p>A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide 3,4,9,10-perylene-based compound having, attached to each of the imide nitrogen atoms a carbocyclic or heterocyclic aromatic ring system substituted with one or more fluorine-containing groups. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating ac thin film transistor device, preferably by sublimation or solution-phase deposition onto a substrate, wherein the substrate temperature is no more than 100° C.</p>
申请公布号 EP1825533(A2) 申请公布日期 2007.08.29
申请号 EP20050852668 申请日期 2005.12.02
申请人 EASTMAN KODAK COMPANY 发明人 SHUKLA, DEEPAK;FREEMAN, DIANE CAROL;NELSON, SHELBY FORRESTER
分类号 H01L51/30 主分类号 H01L51/30
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