发明名称 MANUFACTURING METHOD OF NOZZLE SUBSTRATE, MANUFACTURING METHOD OF DROPLET DISCHARGE HEAD, AND MANUFACTURING METHOD OF DROPLET DISCHARGE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a nozzle substrate, a manufacturing method of a droplet discharge head, and a manufacturing method of a droplet discharge device in which a silicon substrate in which a nozzle shape is processed is attached to a supporting substrate by resin so that a burr of a silicon oxide film or a resin residue does not remain in the nozzle when resin for attachment which fills the nozzle is pulled out. SOLUTION: The manufacturing method of the nozzle substrate for forming a nozzle having a first nozzle hole and a second nozzle hole in the silicon substrate includes a step of forming the first nozzle hole and the second nozzle hole, a step of attaching the supporting substrate to the silicon substrate by using the resin, a step of filling the recessed portion with the resin, a step of laminating the silicon substrate and opening the first nozzle hole from the laminated silicon substrate, a step of removing the resin filling the first nozzle hole, a step of forming an oxide film and a water repellent film on the silicon substrate, and a step of peeling off the supporting substrate from the silicon substrate. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007098888(A) 申请公布日期 2007.04.19
申请号 JP20050294854 申请日期 2005.10.07
申请人 SEIKO EPSON CORP 发明人 ARAKAWA KATSUHARU;BIZEN RYOICHI
分类号 B41J2/135 主分类号 B41J2/135
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