发明名称 PATTERN FORMING METHOD, COLOR FILTER AND LIQUID CRYSTAL DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To provide a pattern forming method with which a pattern of proper profile can be formed. <P>SOLUTION: The pattern forming method for forming a pattern of a color filter member includes at least a photosensitive resin layer forming step of forming a photosensitive resin layer comprising a photosensitive resin composition on a substrate; a pattern exposure step of forming a two-dimensional image by exposing the photosensitive resin layer by relative scanning, while modulating light based on image data; and a development step of developing the exposed photosensitive resin layer, wherein &gamma; of the photosensitive resin layer is 1-15 and the extinction ratio of an exposure device used for the pattern exposure is &le;10%. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007101742(A) 申请公布日期 2007.04.19
申请号 JP20050289309 申请日期 2005.09.30
申请人 FUJIFILM CORP 发明人 SERIZAWA SHINICHIRO;SUMI KATSUTO;SATO MORIMASA
分类号 G02B5/20;G02F1/1335;G03F7/004 主分类号 G02B5/20
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