发明名称 |
PATTERN FORMING METHOD, COLOR FILTER AND LIQUID CRYSTAL DISPLAY |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method with which a pattern of proper profile can be formed. <P>SOLUTION: The pattern forming method for forming a pattern of a color filter member includes at least a photosensitive resin layer forming step of forming a photosensitive resin layer comprising a photosensitive resin composition on a substrate; a pattern exposure step of forming a two-dimensional image by exposing the photosensitive resin layer by relative scanning, while modulating light based on image data; and a development step of developing the exposed photosensitive resin layer, wherein γ of the photosensitive resin layer is 1-15 and the extinction ratio of an exposure device used for the pattern exposure is ≤10%. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007101742(A) |
申请公布日期 |
2007.04.19 |
申请号 |
JP20050289309 |
申请日期 |
2005.09.30 |
申请人 |
FUJIFILM CORP |
发明人 |
SERIZAWA SHINICHIRO;SUMI KATSUTO;SATO MORIMASA |
分类号 |
G02B5/20;G02F1/1335;G03F7/004 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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