ARRANGEMENT FOR MONITORING THERMAL SPRAY PROCESSES

摘要

The invention relates to an arrangement for measuring characteristic properties of a plasma beam in a thermal spray process, said arrangement comprising means for introducing spray materials into the plasma, a one-dimensional or two-dimensional array consisting of first optical waveguides (2a) for receiving the light radiation emitted by the plasma (1), and other optical waveguides (2b, 2c) for distributing the light radiation emitted by the plasma (1). According to the invention, means (W) are provided for splitting the light guided in the first optical waveguides (2a) into the other optical waveguides (2b, 2c), one optical waveguide (2c) being connected to the opening diaphragm of a particle flow arrangement (7), and the other optical waveguide (2b) being connected to the opening diaphragm of a spectrometer (3). Means (5, 7) are also provided for determining the current state of the spray process.