摘要 |
<p>The invention relates to a device for gasification of material comprising: a chamber (1) for mixing a plasma and material to be treated, comprising openings (12, 12′, 13, 13′, 14) for positioning means for injecting a flow of said material and for positioning at least one plasma source, and forming a zone (300) for a homogenous mixture of a flow of said material and at least one plasma jet (200, 200′) a zone for reaction (5a, 5b), of a mixture of said material and the plasma, in communication with an opening of the chamber and extending axially.</p> |
申请人 |
EUROPLASMA;COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
MICHON, ULYSSE;ROUGE, SYLVIE;GRAMONDI, PATRICK;BROTHIER, MERYL;SEILER, JEAN-MARIE;LABROT, MAXIME |