| 摘要 |
<p>PURPOSE: A dry etch apparatus is provided to smoothly drive without a warpage or a scratch by using a lift pin. CONSTITUTION: A dry etch apparatus comprises a supporting plate(100) for supporting or fixing a substrate using a static-electricity, an inserting hole(110) formed on the supporting plate(100), a lift pin(200) inserted into the inserting hole(110) for supporting the substrate so as to easily transfer the substrate by moving the substrate up and down, a plate(300) for fixing a number of lift pins(200) and an upper electrode confronted with the supporting plate(100) used as a lower electrode for supplying a high frequency power for forming plasma under dry etch. At this time, the lift pin(200) has a mortar shape, thereby preventing a warpage or a scratch.</p> |
