PHOTORESIST DEVELOPER AND PROCESS FOR PRODUCING SUBSTRATE WITH THE USE OF THE DEVELOPER
摘要
<p>A photoresist developer comprising a basic aqueous solution containing a nonionic surfactant and an ammonium compound, wherein specified nonionic surfactants are contained in an amount of 0.5 to 10 mass% and specified ammonium compounds in an amount of 0.01 to 5.0 mass%. Thus, there can be provided a photoresist developer that even in the development of thick-film resist, is free from scumming and can realize excellent pattern formation.</p>
