<p>A test pattern is formed on a substrate (F) based on test data supplied from a test data memory (80), and a line width of the test pattern is measured. Mask data is set to have a specified micromirror of a DMD, which constitutes exposure heads (24a-24j), in an off state fixedly at a mask data setting section (86), so that a light quantity is corrected by a line width changing quantity.</p>
申请公布号
WO2006104170(A1)
申请公布日期
2006.10.05
申请号
WO2006JP306361
申请日期
2006.03.28
申请人
FUJI PHOTO FILM CO., LTD.;SUZUKI, ISSEI;SUMI, KATSUTO;KOWADA, KAZUTERU