METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a reflective photomask in which a designed pattern can be embodied correctly to an object by embodying an absorber pattern of the reflective photomask like the designed pattern.

SOLUTION: The method for manufacturing the reflective photomask comprises a step of preparing a substrate 100, a step of forming a reflective layer 110 which can reflect an EUVL light onto the substrate 100; a step of forming an oxide layer on the reflective layer 110; a step of forming an oxide pattern which consists of an oxide pattern body and an oxide window defined thereby by patterning the oxide layer; a step of forming an absorber pattern 140 by filling the oxide window with an absorbing material which can absorb the EUVL light; and a step of removing the oxide pattern body.

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