EXPOSURE METHOD, METHOD FOR FORMING IRREGULAR PATTERN, AND METHOD FOR MANUFACTURING OPTICAL ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide an exposure method, or the like, for easily forming an exposure pattern with a line width in a sub-micron size using a photoresist for g-line and i-line by using a solid laser or a gas laser which is inexpensive and stable as an exposure light source.

SOLUTION: A predetermined part of a photosensitive material layer having a predetermined thickness formed on the surface of a substrate W is irradiated with a laser beam while controlling the beam intensity and the scanning speed so as to expose while locally controlling the reaction time constant of the photosensitive material.

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