发明名称 Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction
摘要 A device for processing gases includes a cylindrical housing in which an electrically grounded, metal injection/extraction gas supply tube is disposed. A dielectric tube surrounds the injection/extraction gas supply tube to establish a gas modification passage therearound. Additionally, a metal high voltage electrode circumscribes the dielectric tube. The high voltage electrode is energizable to create nonthermal electrical microdischarges between the high voltage electrode and the injection/extraction gas supply tube across the dielectric tube within the gas modification passage. An injection/extraction gas and a process gas flow through the nonthermal electrical microdischarges within the gas modification passage and a modified process gas results. Using the device contaminants that are entrained in the process gas can be destroyed to yield a cleaner, modified process gas.
申请公布号 US2006193759(A1) 申请公布日期 2006.08.31
申请号 US20060417096 申请日期 2006.05.03
申请人 ROSOCHA LOUIS A 发明人 ROSOCHA LOUIS A.
分类号 B01J19/08;B01D53/32;H01J37/32 主分类号 B01J19/08
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