| 发明名称 |
Disturbance-free, recipe-controlled plasma processing system and method |
| 摘要 |
A plasma processing system includes a first unit for plasma-processing a sample based on a recipe for plasma processing, and a second unit for modifying the recipe in accordance with a monitored value obtained during the plasma processing of the sample in the first unit. A next sample is plasma processed in the first unit based on the modified recipe.
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| 申请公布号 |
US2006124243(A1) |
申请公布日期 |
2006.06.15 |
| 申请号 |
US20060346298 |
申请日期 |
2006.02.03 |
| 申请人 |
KAGOSHIMA AKIRA;YAMAMOTO HIDEYUKI;IKUHARA SHOJI;MASUDA TOSHIO;KITSUNAI HIROYUKI;TANAKA JUNICHI;MORIOKA NATSUYO;TAMAKI KENJI |
发明人 |
KAGOSHIMA AKIRA;YAMAMOTO HIDEYUKI;IKUHARA SHOJI;MASUDA TOSHIO;KITSUNAI HIROYUKI;TANAKA JUNICHI;MORIOKA NATSUYO;TAMAKI KENJI |
| 分类号 |
C23F1/00;H05H1/00;B01J19/08;H01J37/32;H01L21/302;H01L21/306;H01L21/3065;H01L21/66 |
主分类号 |
C23F1/00 |
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