PHOTOSENSITIVE POLYMER COMPOSITION

摘要

PURPOSE:To enable the formation of an alpha-ray shielding film for LSI or a memory device or an interlaminar insulating film for a multilayered thin film substrate by using a polymer having specified repeating units as the principal component as polyamic acid. CONSTITUTION:When a photosensitive polymer compsn. is composed of polyamic acid, an amine compd. having a C=C bond and a sensitizer or a photo-cross- linking agent, a polymer having repeating units represented by the formula as the principal component is used as the polyamic acid. In the formula, R<1> is an arom. group capable of maintaining heat resistance and R<2> is an aliphat. group improving the UV transmitting property. A pattern of 10-50mum thickness can be formed with the resulting photosensitive polymer compsn., so the compsn. can be used to form an alpha-ray shielding film for a memory device or an interlaminar insulating film for a multilayered thin film substrate.