| 摘要 |
PURPOSE:To prevent conveying error by forming a wafer position detecting pattern on a glass plate. CONSTITUTION:The steps of forming semiconductor element forming reticle pattern projection image and a semiconductor wafer position detecting pattern on a glass plate, and moving the plate by an optical sensor are provided. That is, a position detecting pattern 2 and an inspection region pattern 3 are formed together with a regist pattern 10 on the plate 1. When an optical sensor 4 in an etching unit is disposed at the pattern 2, sensor light 15 is reflected on a rear surface to detect the presence of the plate. The presence or absence of a reticle defect is automatically inspected by a light transmission type reticle inspecting unit by the pattern 3. |
