| 摘要 |
A semiconductor chip circuit device includes cell arrays having pairs of an n-channel device formation region and a p-channel device formation region. Conductive power source lines are selectively formed between the pairs and are situated in grooves in the substrate. The conductive lines are selectively connected to impurity introduction regions in each formation region of each pair. An insulating layer is formed in the grooves over the conductive lines, and wirings selectively connect a plurality of pairs formed on the insulating layer.
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