发明名称 X-RAY EXPOSING METHOD
摘要 PURPOSE:To control an exposure system such as mirror vibration and the like without impairing a through put by a method wherein the energy of accumulated electrons are increased or decreased in such a manner that the power which is absorbed in or radiated to a radiation sensitive material is uniformly maintained for a specific period. CONSTITUTION:The pattern drawn on a mask is transferred to the radiant light sensing material by projecting a synchrotoron radiation light. In order to uniformly maintain the power absorbed or projected to the radiant light sensing material for the specific period, the energy of the accumulated electrons on an electron-storage ring is increased gradually, and when the energy reached a fixed value, the energy is decreased, and the accumulated electrons are increased so as to uniformly maintain the power which is absorbed or projected to the radiation reuritive material again. The radiant light is made to irradiate by repeating the above-mentioned operation.
申请公布号 JPH03152919(A) 申请公布日期 1991.06.28
申请号 JP19890292758 申请日期 1989.11.09
申请人 NEC CORP 发明人 HASEGAWA SHINYA
分类号 G03F1/22;H01L21/027 主分类号 G03F1/22
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