PROCESS FOR PRODUCING MICROSTRUCTURES WITH LOCALLY DIFFERENT STRUCTURAL HEIGHTS

摘要

The invention relates to a process for producing microstructures with locally different structural heights in which: (a) a layer of a positive resist material sensitive to X-radiation is partially irradiated with X-rays using a mask; (b) the irradiated areas are removed with the aid of a developer. The purpose is to propose a process for producing stepped microstructures making step height tolerances in the micrometre range possible. In addition, the microstructures are to be given high solvent resistance and good mechanical properties. The aim is achieved by the invention in that: (c) the layer of the resist material is provided with microstructures on the side towards the radiation before steps (a and b) are performed.