RETICLE AND ITS MANUFACTURE

摘要

PURPOSE:To offer the reticle whose pattern can accurately be formed even when the pattern area of the reticle becomes large and its manufacturing method as to the reticle which is used to expose a chip pattern at the time of the manufacture of a semiconductor device. CONSTITUTION:The reticle has plural 2nd substrates 4 stuck together successively on a 1st substrate 3 and the pattern 1 is formed over the 2nd substrates 41 and the manufacturing method consists of a process wherein the pattern 1 is formed divisionally on the 2nd substrates 4 and a process wherein the 2nd substrates 4 are stuck successively on the 1st substrate 3 so that the pattern 1 is composed.