发明名称 |
Thin-film transistor using nano-crystalline thin-film as active layer, and method for fabricating the same |
摘要 |
A top-gate thin-film transistor includes a substrate 10 made of glass, silicon, or plastic; a hydrophilic buffer layer 15 deposited on the substrate to facilitate the formation of a nano- crystalline thin-film thereon; a thermally treated nano-crystalline thin-film layer 20 as an active layer; source and drain electrodes 31, 32; a gate insulating layer 40 formed on the nano-crystalline thin-film layer by use of a high dielectric constant insulator and a top-gate electrode 50 formed on the gate insulating layer. With this configuration, the top-gate thin-film transistor and a logic circuit using the same can be operated at low voltages and be fabricated at low-temperatures. |
申请公布号 |
GB2457872(A) |
申请公布日期 |
2009.09.02 |
申请号 |
GB20080002637 |
申请日期 |
2008.02.13 |
申请人 |
KOREA UNIVERSITY INDUSTRIAL & ACADEMIC COLLABORATION FOUNDATION |
发明人 |
SANGSIG KIM;KYOUNGAH CHO;DONG-WON KIM;JAEWON JANG |
分类号 |
H01L21/336;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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