发明名称 |
System for characterization of low-k dielectric material damage |
摘要 |
A method of detecting damage to at least one dielectric layer in an IC die by determining a capacitance factor. The capacitance factor can be used to determine damage in a low-k dielectric material. A system for detecting damage can include a conductive line structure for measuring capacitance and software or a device for determining the capacitance to determine the damage.
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申请公布号 |
US7576357(B1) |
申请公布日期 |
2009.08.18 |
申请号 |
US20050259572 |
申请日期 |
2005.10.26 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
ZHU JIANHONG;WU DAVID |
分类号 |
H01L23/58 |
主分类号 |
H01L23/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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